Josephson junctions' topological signatures studied

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Multiterminal Josephson junctions

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Josephson junctions

Phys Org

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Resistance measurement approach successfully observes topological signatures in multiterminal Josephson junctions

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Researchers at Northwestern University and Aalto University recently proposed a new approach to studying the topological signatures of multiterminal Josephson junctions.

Using their approach, they were able to observe these signatures, while also unveiling resistance patterns that are far richer than those predicted by physics theories.

Their findings could collectively improve the understanding of these devices shedding light on their unique topological behavior.

Researchers used Josephson junctions with a normal metal in which electron transport is diffusive.

In their future research, they will examine devices in which this transport is ballistic.

They will also use graphene as the normal metal and will also employ on-chip field coils in order to control phase differences.

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