TSMC's EUV, High-NA Investment

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NA EUV lithography

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first commercial EUV lithography process

TechSpot

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TSMC prepares for next-gen chip manufacturing with high-NA EUV investments

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TSMC was expected to receive its first high numerical aperture (high-NA) extreme ultraviolet (EUV) lithography system, the "EXE:5000," from Dutch manufacturer ASML in September 2024 .

Adopting high-NA EUV scanners is pivotal for TSMC 's development of sub-2nm processes.

These advanced systems increase the numerical aperture from 0.33 to 0.55 .

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