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latest lithography platformTrendForce
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69% Informative
Canon has announced that it will deliver its latest lithography platform, the FPA-1200NZ2C nanoimprint lithography ( NIL ) system to the Texas Institute for Electronics (TIE), a semiconductor consortium based in Texas .
NIL technology creates circuit patterns using a different approach than traditional projection exposure technology.
Canon aims to sell “ a dozen units each year within 3 to 5 years ”.
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