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[News] Canon Delivers Nanoimprint Lithography System to TIE, Reportedly Capable of Producing 2nm Chips | TrendForce News

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Summary
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69% Informative

Canon has announced that it will deliver its latest lithography platform, the FPA-1200NZ2C nanoimprint lithography ( NIL ) system to the Texas Institute for Electronics (TIE), a semiconductor consortium based in Texas .

NIL technology creates circuit patterns using a different approach than traditional projection exposure technology.

Canon aims to sell “ a dozen units each year within 3 to 5 years ”.

VR Score

65

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64

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formal

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English

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81

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